Ultra ALN™
ULTRA-HIGH PURITY ALUMINIUM NITRATE Al(NO₃)₃.9H₂O
Alpha HPA proudly offers our Ultra-High Purity Aluminium Nitrate™ (Ultra ALN™) as the purest aluminium nitrate product available at a commercial scale, boasting an exceptional purity level of >99.999% (5N). Available in both crystal and solution form, this high-purity aluminium nitrate is specifically designed for cutting-edge industries requiring the highest standards of material quality and performance.
UNITS | ULTRA ALN™ | |||
Description | Ultra-High Purity Aluminium Nitrate | |||
Chemical Formula | Al(NO₃)₃·9H₂O | |||
Purity | % solid | 5N - 99.999% | ||
Processing | Unmilled | |||
Impurity Panel | ICP | < 10 PPM | ||
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THE VERSATILITY OF OUR
ULTRA ALN™ FOR INDUSTRY APPLICATIONS
Our Ultra ALN™ is a critical precursor for coating lithium-ion battery electrodes. Its ultra-high purity ensures exceptional performance, contributing to improved battery life, energy density, and thermal stability in electric vehicles (EVs) and other energy storage applications. This makes it a key material for next-generation batteries.
Our Ultra ALN™ is essential for producing micro-LED phosphors, which are used in cutting-edge display technologies. Its high purity and consistency help achieve precise colour emission and brightness control, supporting the advancement of ultra-high-definition displays, including smartphones, televisions, and VR headsets.
In laser technology, especially for YAG (Yttrium Aluminium Garnet) lasers, our Ultra ANI™ ensures the formation of highly uniform, defect-free crystals. These crystals are used in various high-power laser applications, including industrial cutting, medical surgeries, and communication technologies.
Our Ultra ALN™ is ideal as an oxidant in CMP slurries, where its ultra-high purity and reactivity enable superior surface planarization in semiconductor manufacturing. Its role in CMP slurries enhances material removal rates and delivers precise surface smoothness required for integrated circuit production.

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